Ultron Systems' Model UH110 and UH110-8 Semiautomatic Film Removers demount film from
3" to 8" wafers after the backgrinding or etching process. The virtual 180° peeling angle ensures more efficient peeling and lower stress on the wafer, resulting in higher yields.
Both systems outperform time-consuming hand removal at a fraction of the cost of fully automatic equipment. Throughput is as high as 200 wafers/hour. The standard Model UH110 can accommodate up to 6" wafers, while the Model UH110-8 handles 8" wafers and smaller. Adjustments from one size wafer to another can be made in seconds by simply changing the workstage. Push-button operation assures ease of use with all operator variables eliminated.
| FEATURES: |
| - Short removal cycle for higher throughput |
| - Virtual 180° peeling angle for lower wafer stress and higher yields |
| - Heated wafer stage: ensures film removal with minimal stress to wafer |
| - Quick peeling-tape reloading |
| - Easy disposal of demounted protective film |
| - No special operator training required |
| - Compact, tabletop size |
| - Faster and lower cost than conventional chemical removal method |
| - Interchangeable wafer stage accommodates different size/type of wafers |
| - Removes film from wafers down to 8 mil thick wafer [UH110-8] |
| - [Model UH110]: Up to 6" wafer/film frame capability (Standard wafer stage included) |
| - [Model UH110-8]: Up to 8" wafer/film frame capability (Standard 8" stage included) |
| OPTIONS: |
| - Additional Standard Wafer Stage [up to 6" for UH110; up to 8" for UH110-8] |
| - Thin Wafer Stage [up to 6" for UH110; up to 8" for UH110-8] |
| - Static Eliminator with Power Safety Interlock Switch [UH110-8] |
| - 'CE' Mark |